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Dynamic Secondary Ion Mass Spectrometry (SIMS) The secondary-ion mass spectrometry (SIMS) instrument will be ideal for measuring concentrations of light elements in materials since the technique is sensitive to all elements in the periodic table. Dynamic SIMS utilizes an ion beam to produce secondary ions and in turn can be used to sputter the sample producing depth profiles with a resolution down to 1 nanometer. By rastering the ion beam across the sample (ion microprobe mode) it is possible to obtain lateral resolutions down to 200 nm. The high mass resolution provided by the use of a magnetic-sector mass spectrometer permits true elemental analysis by eliminating the numerous possible interfering ions generated by complex samples. Together, these capabilities provide a detailed three-dimensional picture of complex, heterogeneous samples ranging from electronic device structures and metallic alloys to geological samples. This particular instrument will be the only one of its kind in Western Canada and is designed to maximize its flexibility for a wide range of studies as well as to provide unsurpassed spatial resolution (both lateral and depth). These capabilities are critical for the studies that will be undertaken .
isotope
ratios in interstellar
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